{"id":525,"date":"2022-06-01T17:50:00","date_gmt":"2022-06-01T09:50:00","guid":{"rendered":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/?post_type=paper&#038;p=525"},"modified":"2024-06-03T18:32:36","modified_gmt":"2024-06-03T10:32:36","slug":"enhanced-triboelectric-performance-based-on-lithography-free-sputtering-processed-pdms-wrinkled-surface","status":"publish","type":"paper","link":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/paper\/enhanced-triboelectric-performance-based-on-lithography-free-sputtering-processed-pdms-wrinkled-surface\/","title":{"rendered":"Enhanced triboelectric performance based on lithography-free sputtering-processed PDMS wrinkled surface"},"content":{"rendered":"\n<p>Tao Wang a,b , Huili Liang a,b,  Yonghui Zhang c , Zengxia Mei <\/p>\n\n\n\n<p><a href=\"https:\/\/doi.org\/10.1016\/j.matlet.2022.132557\">https:\/\/doi.org\/10.1016\/j.matlet.2022.132557<\/a><\/p>\n","protected":false},"featured_media":527,"template":"","acf":[],"_links":{"self":[{"href":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/wp-json\/wp\/v2\/paper\/525"}],"collection":[{"href":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/wp-json\/wp\/v2\/paper"}],"about":[{"href":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/wp-json\/wp\/v2\/types\/paper"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/wp-json\/wp\/v2\/media\/527"}],"wp:attachment":[{"href":"https:\/\/frontbasic.sslab.org.cn\/oxide-semiconductor\/wp-json\/wp\/v2\/media?parent=525"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}